Vacuum deposition

Results: 107



#Item
31Workshop on Nanoscience for Solar Energy ConversionOctoberMesoscopic Donor-Acceptor Multilayer by Ultra-High-Vacuum Deposition of

Workshop on Nanoscience for Solar Energy ConversionOctoberMesoscopic Donor-Acceptor Multilayer by Ultra-High-Vacuum Deposition of

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Source URL: portal.ictp.it

Language: English - Date: 2009-09-14 11:30:02
32PLD Components  ¾ Ideal for retrofit of existing or construction of new PLD systems. ¾ Reliable, robust designs backed by extensive research experience.

PLD Components ¾ Ideal for retrofit of existing or construction of new PLD systems. ¾ Reliable, robust designs backed by extensive research experience.

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Source URL: www.neocera.com

Language: English - Date: 2013-01-04 14:36:20
33Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2008S2-003 Effects of thermal annealing on charge density and N chemical states in HfSiON films studied by photoemission spectroscopy

Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2008S2-003 Effects of thermal annealing on charge density and N chemical states in HfSiON films studied by photoemission spectroscopy

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Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:36:05
34ALD System  Atomic Layer Deposition Engines for Thin Film Innovation  SVT Associates, Inc.

ALD System Atomic Layer Deposition Engines for Thin Film Innovation SVT Associates, Inc.

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Source URL: www.svta.com

Language: English - Date: 2014-05-29 14:44:23
35OXFORD APPLIED RESEARCH Ultra-clean operation Sub-monolayer control Software programming

OXFORD APPLIED RESEARCH Ultra-clean operation Sub-monolayer control Software programming

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Source URL: www.oaresearch.co.uk

Language: English - Date: 2015-04-23 17:42:57
36Photon Factory Activity Report 2007 #25 Part BSurface and Interface 2C/2005S2-002  Hf-silicidation reactions due to vacuum annealing for a-Si/ HfSiO(N)/ Si gate

Photon Factory Activity Report 2007 #25 Part BSurface and Interface 2C/2005S2-002 Hf-silicidation reactions due to vacuum annealing for a-Si/ HfSiO(N)/ Si gate

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Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:34:50
37Manuscript Title in Title Case

Manuscript Title in Title Case

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Source URL: www.djs.si

Language: English - Date: 2013-11-20 15:37:18
38Electron Beam Evaporator E-Beam Evaporator - The e -flux Mini E-Beam Evaporator is an evaporator for small and medium quantities of almost any material in the temperature range of 400K to 3100K. Evaporation is possible

Electron Beam Evaporator E-Beam Evaporator - The e -flux Mini E-Beam Evaporator is an evaporator for small and medium quantities of almost any material in the temperature range of 400K to 3100K. Evaporation is possible

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Source URL: www.tectra.de

Language: English - Date: 2010-10-03 07:16:00
39Microsoft Word - Exp PhysicsWinter Syllabus.doc

Microsoft Word - Exp PhysicsWinter Syllabus.doc

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Source URL: www.pdx.edu

Language: English - Date: 2013-03-09 14:35:09
40Sputter-Coater high vacuum coating system for thin film deposition Sputter-Coater with optional instruments and side rack  Tectra enlarges it’s successful range of small high vacuum coating systems by the

Sputter-Coater high vacuum coating system for thin film deposition Sputter-Coater with optional instruments and side rack Tectra enlarges it’s successful range of small high vacuum coating systems by the

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Source URL: www.tectra.de

Language: English - Date: 2012-06-08 03:30:18